• 208 B transistors !!

    From MitchAlsup1@21:1/5 to All on Thu Apr 18 19:41:09 2024
    https://youtube.com/shorts/x5aiu7BTi7E?si=0knTN4-yUVOXSEsy

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  • From EricP@21:1/5 to All on Thu Apr 18 17:47:17 2024
    MitchAlsup1 wrote:
    https://youtube.com/shorts/x5aiu7BTi7E?si=0knTN4-yUVOXSEsy

    A quicky search finds the current EUV maximum reticle size is
    about 26 mm by 33 mm or 858 mm² (~1 inch by 1.25 inch).

    That chip sure looks bigger than that.

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  • From MitchAlsup1@21:1/5 to EricP on Thu Apr 18 22:41:01 2024
    EricP wrote:

    MitchAlsup1 wrote:
    https://youtube.com/shorts/x5aiu7BTi7E?si=0knTN4-yUVOXSEsy

    A quicky search finds the current EUV maximum reticle size is
    about 26 mm by 33 mm or 858 mm² (~1 inch by 1.25 inch).

    That chip sure looks bigger than that.



    It looks to me about 4× that reticle limit.

    In the early 1980s someone (Amdahl?) was working on wafer scale
    lithography, apparently we have now arrived.....

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  • From EricP@21:1/5 to All on Thu Apr 18 19:29:58 2024
    MitchAlsup1 wrote:
    EricP wrote:

    MitchAlsup1 wrote:
    https://youtube.com/shorts/x5aiu7BTi7E?si=0knTN4-yUVOXSEsy

    A quicky search finds the current EUV maximum reticle size is
    about 26 mm by 33 mm or 858 mm² (~1 inch by 1.25 inch).

    That chip sure looks bigger than that.

    It looks to me about 4× that reticle limit.

    In the early 1980s someone (Amdahl?) was working on wafer scale
    lithography, apparently we have now arrived.....

    As part of a sales deal, in 1981 my then employer rented me and
    another guy for on-site support to Trilogy Systems,
    Amdahl's then attempt to build wafer scale IBM 370 compatibles.
    I got to live in sunny Palo Alto all expense paid for 6 months.

    Trilogy were building it with ECL macro cells on 3" wafers
    with interconnect wires patterned between 0.25" * 0.25" reticles,
    trimmed down to a single chip about 2.5" by 2.5" afterwards.

    Part of it was inventing a way to dissipate 1200 watts from
    the above chips, using liquid freon IIRC.

    Also there was no software CAD tools then so all that had to be
    invented from scratch too.

    They burned through $250 million in seed capital (DEC was one investor)
    and closed, merged into Elxsi according to Wikipedia.

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  • From Scott Lurndal@21:1/5 to mitchalsup@aol.com on Fri Apr 19 01:08:28 2024
    mitchalsup@aol.com (MitchAlsup1) writes:
    EricP wrote:

    MitchAlsup1 wrote:
    https://youtube.com/shorts/x5aiu7BTi7E?si=0knTN4-yUVOXSEsy

    A quicky search finds the current EUV maximum reticle size is
    about 26 mm by 33 mm or 858 mm² (~1 inch by 1.25 inch).

    That chip sure looks bigger than that.



    It looks to me about 4× that reticle limit.

    In the early 1980s someone (Amdahl?) was working on wafer scale
    lithography, apparently we have now arrived.....


    Cerebras has a wafer-scale chip in production.

    Self healing, and works around defects.

    The CS-3 has 900,000 cores and 44GB on-chip memory.

    https://www.cerebras.net/

    --- SoupGate-Win32 v1.05
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  • From Scott Lurndal@21:1/5 to mitchalsup@aol.com on Fri Apr 19 01:11:02 2024
    mitchalsup@aol.com (MitchAlsup1) writes:
    EricP wrote:

    MitchAlsup1 wrote:
    EricP wrote:

    MitchAlsup1 wrote:
    https://youtube.com/shorts/x5aiu7BTi7E?si=0knTN4-yUVOXSEsy

    A quicky search finds the current EUV maximum reticle size is
    about 26 mm by 33 mm or 858 mm² (~1 inch by 1.25 inch).

    That chip sure looks bigger than that.

    It looks to me about 4× that reticle limit.

    In the early 1980s someone (Amdahl?) was working on wafer scale
    lithography, apparently we have now arrived.....

    As part of a sales deal, in 1981 my then employer rented me and
    another guy for on-site support to Trilogy Systems,
    Amdahl's then attempt to build wafer scale IBM 370 compatibles.
    I got to live in sunny Palo Alto all expense paid for 6 months.

    I really enjoyed my time in "the valley" for the 18 months I was there.
    All expenses paid would have been a goodly bonus situation.

    I've lived and worked there for thirty five years now. Just got
    back from a hike in a nearby redwood forest.

    --- SoupGate-Win32 v1.05
    * Origin: fsxNet Usenet Gateway (21:1/5)
  • From MitchAlsup1@21:1/5 to EricP on Fri Apr 19 00:24:16 2024
    EricP wrote:

    MitchAlsup1 wrote:
    EricP wrote:

    MitchAlsup1 wrote:
    https://youtube.com/shorts/x5aiu7BTi7E?si=0knTN4-yUVOXSEsy

    A quicky search finds the current EUV maximum reticle size is
    about 26 mm by 33 mm or 858 mm² (~1 inch by 1.25 inch).

    That chip sure looks bigger than that.

    It looks to me about 4× that reticle limit.

    In the early 1980s someone (Amdahl?) was working on wafer scale
    lithography, apparently we have now arrived.....

    As part of a sales deal, in 1981 my then employer rented me and
    another guy for on-site support to Trilogy Systems,
    Amdahl's then attempt to build wafer scale IBM 370 compatibles.
    I got to live in sunny Palo Alto all expense paid for 6 months.

    I really enjoyed my time in "the valley" for the 18 months I was there.
    All expenses paid would have been a goodly bonus situation.

    Trilogy were building it with ECL macro cells on 3" wafers
    with interconnect wires patterned between 0.25" * 0.25" reticles,
    trimmed down to a single chip about 2.5" by 2.5" afterwards.

    Part of it was inventing a way to dissipate 1200 watts from
    the above chips, using liquid freon IIRC.

    Imagine how quickly a 1 oz hunk of silicon would get hot at 1200 Watts
    of input power.

    Also there was no software CAD tools then so all that had to be
    invented from scratch too.

    They burned through $250 million in seed capital (DEC was one investor)
    and closed, merged into Elxsi according to Wikipedia.

    There have been similarly large expenditures in AI chips over the last decade.....to mostly naught.

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  • From John Savard@21:1/5 to All on Sat Apr 20 22:28:41 2024
    On Thu, 18 Apr 2024 22:41:01 +0000, mitchalsup@aol.com (MitchAlsup1)
    wrote:

    In the early 1980s someone (Amdahl?) was working on wafer scale
    lithography, apparently we have now arrived.....

    Actually, several companies were. The one mentioned, Trilogy, was the
    one that spun off of Amdahl. There was also the company that was going
    to make the solid state storage wafer for the Sinclair, the name of
    which was Anamartic. Texas Instruments and ITT also researched its possibilities.

    John Savard

    --- SoupGate-Win32 v1.05
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  • From MitchAlsup1@21:1/5 to BGB on Sun Apr 21 22:02:34 2024
    BGB wrote:

    On 4/20/2024 11:28 PM, John Savard wrote:
    On Thu, 18 Apr 2024 22:41:01 +0000, mitchalsup@aol.com (MitchAlsup1)
    wrote:

    In the early 1980s someone (Amdahl?) was working on wafer scale
    lithography, apparently we have now arrived.....

    Actually, several companies were. The one mentioned, Trilogy, was the
    one that spun off of Amdahl. There was also the company that was going
    to make the solid state storage wafer for the Sinclair, the name of
    which was Anamartic. Texas Instruments and ITT also researched its
    possibilities.


    On the other side of things, I am wondering what sorts of densities and
    clock speeds are possible with printed electronics on a plastic
    substrate (such as PET).

    Information on the subject is fairly sparse, but inks seem to be
    available (albeit expensive), albeit with some variation as to printer technology. Seems to be be either organic or inorganic inks, with
    inkjet, offset, and screen printing, as the main variations in printer technology (with different inks for the different methods).

    To determine wire delay per unit length, one would need the LRC values
    of the conductor and insulators. Copper on Epoxy allows for transmission
    speeds of ½ that of light, and I think you would be resistance limited.

    So, we need:: 1) Ohms per square, 2) inductance per unit length, and
    3) capacitance per unit area.

    Though, I will assume that by inkjet, they don't mean just using a
    repurposed consumer-grade printer (possibly with the ROM's hacked to
    allow them to use refilled ink cartridges, with the non-standard inks).

    Then again, with these things, they have created a situation where there
    are a lot of old inkjet printers around, mostly because it is often
    cheaper to buy a whole new printer than to buy the ink refill cartridges
    for said printer (vs, say, laser printers where the printer is more expensive, but the toner refills are more reasonable).

    Looking around, it seems some people are instead using the more "office style" inkjet printers for this (which apparently allow for refilling
    the ink cartridges).


    Also seems the N and P doped inks are rarer and more expensive than the conductive metallic and insulator inks.

    No information on what sorts of densities are possible; crude guess is
    it is roughly a ~ 133333um process, based on the assumption of a 300 dpi printer (possibly more or less).

    300 DPI is 1995 technology, I would be surprised if you could not find
    4800 DPI printers. This, alone, changes the lambda by 160×.

    If one assumes, say, 6-dots width for a transistor, this would be ~
    50x50 transistors per square inch, or possibly ~ 200k transistors per
    page...

    Generally, the planar technologies had 6 lambda (min) source and drains
    with 4 Lambda gates and one would need 9 lambda to drop a contact on
    a source or drain. So, a minimum contacted transistor would be 9+4+9
    = 22 lambda wide. Generally one wanted 4 lambda between different
    active regions, to the pitch of this minimum contacted transistor would
    be 9+4 = 13 lambda.

    I guess, if one could get it to run at MHz speeds, this could be enough
    for a CPU.

    Though, would likely need multiple passes through the printer to print something like this, say:
    Print transistor layers;
    Bake the sheet;
    Print insulator and metal trace layers;
    Bake;
    Print more insulator and metal trace layers;
    Bake;
    ...

    Your typical 2 layer metal CMOS process in 1.5µ had 200 steps in it.
    1) spin on resist
    2) bake resist
    3) expose resist (mask 1: P-wells and N-well contacts)
    4) develop resist
    5) etch resist
    6) clean wafer
    7) ion-implant exposed wafer
    8) clean wafer

    8 similar steps for N-wells

    17) deposit polysilicon
    18) bake polysilicon
    19) spin on resist
    20) bake resist
    21) expose resist
    22) develop resist
    23) etch resist
    24) clean wafer

    25) spin on resist
    26) bake resist
    27) expose resist (P-Channel)
    28) develop resist
    29) etch resist
    30) clean wafer
    31) P-channel implants (arsenic)

    32) spin on resist
    33) bake resist
    34) expose resist (N-Channel)
    35) develop resist
    36) etch resist
    37) clean wafer
    38) N-channel implants (phosphorous)

    Then, for each contact layer one has 8 steps, and for each metal layer
    one would have 10 steps. Then a thick passivation, then cutting of the
    bonding pads, and finally, a back lap of the wafer to clean contaminates
    and a 3 atom thick gold sputter so one can solder the Si die to the
    package.

    So, the problem becomes one of how does one get the pads attached to
    the "other" components in the system ??

    Possibly, a person could also print vias and then do multiple layers of transistors per page, possibly up to some set limit.


    Not entirely sure how one would go about mapping digital logic onto
    printable layers though. This may well be the hard part.

    Straightforward place and route.

    I will make a guess that there are probably no Verilog to semiconductive-ink-PNG compilers.


    ....


    John Savard

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  • From Terje Mathisen@21:1/5 to BGB on Mon Apr 22 08:08:31 2024
    BGB wrote:
    On 4/21/2024 5:02 PM, MitchAlsup1 wrote:
    BGB wrote:

    No information on what sorts of densities are possible; crude guess
    is it is roughly a ~ 133333um process, based on the assumption of a
    300 dpi printer (possibly more or less).

    300 DPI is 1995 technology, I would be surprised if you could not find
    4800 DPI printers. This, alone, changes the lambda by 160×.


    The stuff I was aware of, printer resolution was usually assumed to be between 72 to 300 DPI.

    Apparently (looks up stuff), inkjet typically ranges from 300 to 720 DPI (with 600 to 1200 for laser printers, and 1000 to 2400 for photo printers).


    Not sure of the DPI of a generic office-style inkjet printer (assuming
    one gets one of the ones that allows for refillable ink cartridges).

    I probably do more high-resolution printing than most of you, since I'm
    the leader of the Mapping Commision of the Norwegian Orienteering
    Federation.

    For any given orienteering map, we need to print very sharp (i.e.
    maximum contrast) lines. Both black (road edges etc) and brown
    (contours) lines are just 0.10mm wide, and since brown requires a CMYK
    mix of either 3 or 4 components, you have to start with a _very_ high resolution printer to consistently get good results.

    2400x2400 DPI is what you really need, it is available on the highest
    end print engines (from Xerox and others), but you also need very good software to generate visually optimal vector to raster conversions (i.e.
    like the industry standard Fiery RIP).

    1200x1200 laser printers are the new medium/low end standard, you can
    get that with A3 size paper at a reasonable price.

    Ink jet photo printers typically deliver significantly smaller dot
    sizes, but at far higher per page costs.

    Terje

    --
    - <Terje.Mathisen at tmsw.no>
    "almost all programming can be viewed as an exercise in caching"

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  • From MitchAlsup1@21:1/5 to BGB on Fri May 3 02:23:24 2024
    BGB wrote:


    I guess, if one could get it to run at MHz speeds, this could be enough
    for a CPU.

    Though, would likely need multiple passes through the printer to print something like this, say:
    Print transistor layers;
    Bake the sheet;
    Print insulator and metal trace layers;
    Bake;
    Print more insulator and metal trace layers;
    Bake;
    ...

    A starting point::

    https://youtube.com/shorts/-eeazBcavUE?si=nGNykOGIrTsvGGL-

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