Would chrome of a thickness of 20 nm be sufficient on a fused silica/quartz substrate? It is possible to have features go to below 40 nm pitch.
See
http://www.appliednt.com/calibration-standards/
http://www.appliednt.com/wp-content/uploads/2016/04/fused-silica.png
Best,
Rob
On Friday, June 10, 2005 at 1:56:24 AM UTC-6, Aidan Karley wrote:
In article <1118357283.686115.212340@g43g2000cwa.googlegroups.com>, Justbeats wrote:
Still leaves me stuck for transmitted light though :-(
Well, if you do manage to find a contact in the semiconductor industry, you might be able to get one of the transmission masks they
use for photolithography. OK, they might be of high contrast only in
the far UV, but you might be lucky ...
Actually, since you'd be talking about getting end-of-life
scrap, and far UV masking is relatively new ... well, it's worth a try.
--
Aidan Karley,
Aberdeen, Scotland,
Location: 57°10' N, 02°09' W (sub-tropical Aberdeen), 0.021233
Written at Fri, 10 Jun 2005 08:50 +0100
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