• Linear accelerator as an EUV soruce for semi-conductor lithography

    From Bill Sloman@21:1/5 to All on Sat Oct 12 00:47:42 2024
    I came across this in IEEE Spectrum

    https://spectrum.ieee.org/euv-fel

    Phil Hobbs got the ASML tin-droplet EUV light source to work, but there
    now seems to be the prospect of better way to do it, with undulators
    acting on high energy electron beam as the EUV source.

    It has always been a fairly obvious idea, but - as the Spectrum article
    makes clear - it's not easy to get enough EUV light out.

    --

    Bill Sloman, Sydney

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